Exploring the influence of Al content on the optical and in… — КазНУ

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Exploring the influence of Al content on the optical and interface properties of HfAlOx mixed gate dielectric thin films and their applications in MOS devices

2024 · Article

Год публикации

2024

Источник: Journal of Materials Science: Materials in Electronics

DOI:

Scopus:

Области знаний

Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials Condensed Matter Physics Atomic and Molecular Physics, and Optics