Exploring the influence of Al content on the optical and in… — KazNU

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Exploring the influence of Al content on the optical and interface properties of HfAlOx mixed gate dielectric thin films and their applications in MOS devices

2024 · Article

Publication year

2024

Source: Journal of Materials Science: Materials in Electronics

DOI:

Scopus:

Fields of knowledge

Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials Condensed Matter Physics Atomic and Molecular Physics, and Optics