Sensitivity and Contrast Characterization of PMMA 950K Resi鈥� 鈥� KazNU

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Sensitivity and Contrast Characterization of PMMA 950K Resist Under 30 keV Focused Ga+ Ion Beam Exposure

2025 路 Article
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Publication year

2025

Authors

Source: Micromachines

DOI:

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Fields of knowledge

Control and Systems Engineering Electrical and Electronic Engineering Mechanical Engineering